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Process optimization for dry etching of InP/InGaAsP-based photonic crystals with a Cl-2/CH4/H-2 mixture on an ICP-RIE
- Conference Paper
Book titleConference proceedings / 2004 International Conference on Indium Phosphide and Related Materials, 16th IPRM, May 31-June 4, 2004, Kagoshima, Japan
Pages / Article No.
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