Fabrication of a hard mask for InP based photonic crystals

Increasing the plasma-etch selectivity of poly(methyl methacrylate) versus SiO2 and SiNx
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Author
Wüest, R.
Strasser, P.
Robin, F.
Erni, D.
Jäckel, H.
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Date
2005-11
Type
  • Conference Paper
Publication status
published
External links
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Journal / series
Journal of vacuum science & technology. Series 2. B
Volume
23(6)
Pages / Article No.
3197 - 3201
Publisher
American Institute of Physics
Event
49th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, Orlando, FL, USA, May 31 - June 3, 2005
Organisational unit
03386 - Jäckel, Heinz  
03262 - Bächtold, Werner  
03472 - Professur für Feldtheorie (ehemalig)  
Notes
Published online 7 December 2005.
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Citations
Cited 21 times in Web of Science
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yes
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