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dc.contributor.author
Wüest, R.
dc.contributor.author
Strasser, P.
dc.contributor.author
Robin, F.
dc.contributor.author
Erni, D.
dc.contributor.author
Jäckel, H.
dc.date.accessioned
2017-06-09T11:06:35Z
dc.date.available
2017-06-09T11:06:35Z
dc.date.issued
2005-11
dc.identifier.issn
1071-1023
dc.identifier.issn
0734-211X
dc.identifier.issn
2166-2746
dc.identifier.issn
2166-2754
dc.identifier.other
10.1116/1.2062567
dc.identifier.uri
http://hdl.handle.net/20.500.11850/35109
dc.language.iso
en
dc.publisher
American Institute of Physics
dc.title
Fabrication of a hard mask for InP based photonic crystals
dc.type
Conference Paper
ethz.title.subtitle
Increasing the plasma-etch selectivity of poly(methyl methacrylate) versus SiO2 and SiNx
ethz.journal.title
Journal of vacuum science & technology. Series 2. B
ethz.journal.volume
23
ethz.journal.issue
6
ethz.pages.start
3197
ethz.pages.end
3201
ethz.event
49th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
ethz.event.location
Orlando, FL, USA
ethz.event.date
May 31 - June 3, 2005
ethz.notes
Published online 7 December 2005.
ethz.identifier.wos
ethz.identifier.nebis
000604586
ethz.publication.place
Melville, NY
ethz.publication.status
published
ethz.leitzahl
03386 - Jäckel, Heinz
ethz.leitzahl
03262 - Bächtold, Werner
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich, direkt::00012 - Lehre und Forschung, direkt::00007 - Departemente, direkt::02140 - Departement Informationstechnologie und Elektrotechnik / Department of Information Technology and Electrical Engineering::02635 - Institut für Elektromagnetische Felder (IEF) / Electromagnetic Fields Laboratory (IEF)::03472 - Professur für Feldtheorie (ehemalig)
ethz.leitzahl.certified
03386 - Jäckel, Heinz
ethz.leitzahl.certified
03262 - Bächtold, Werner
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich, direkt::00012 - Lehre und Forschung, direkt::00007 - Departemente, direkt::02140 - Departement Informationstechnologie und Elektrotechnik / Department of Information Technology and Electrical Engineering::02635 - Institut für Elektromagnetische Felder (IEF) / Electromagnetic Fields Laboratory (IEF)::03472 - Professur für Feldtheorie (ehemalig)
ethz.date.deposited
2017-06-09T11:06:41Z
ethz.source
ECIT
ethz.identifier.importid
imp59364e0aee88f28877
ethz.ecitpid
pub:56342
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-14T21:09:33Z
ethz.rosetta.lastUpdated
2018-08-02T07:55:28Z
ethz.rosetta.versionExported
true
ethz.COinS
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