Effects of Electrochemical Etching on InP HEMT Fabrication - Research Collection

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Autor(in)

Saranovac, Tamara

Arabhavi, Akshay M.

Ostinelli, Olivier

Bolognesi, Colombo R.

Datum

2019-11

Typ

Journal Article

Zitate

1 Zitate in Web of Science

1 Zitate in Scopus

ETH Bibliographie

yes

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Publikationsstatus

published

Externe Links

https://doi.org/10.1109/tsm.2019.2940320

Zeitschrift / Serie

IEEE Transactions on Semiconductor Manufacturing

Band

32(4)

Seiten / Artikelnummer

496 - 501

Verlag

IEEE

Thema

High Electron Mobility Transistor (HEMT); Electrochemical Etching; Contact Resistance; Metal Lift-Off

Organisationseinheit

03721 - Bolognesi, Colombo / Bolognesi, Colombo
02205 - FIRST-Lab / FIRST Center for Micro- and Nanoscience

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Zitate

1 Zitate in Web of Science

1 Zitate in Scopus

ETH Bibliographie

yes

Altmetrics