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dc.contributor.author
Danzi, Stefano
dc.contributor.author
Menetrey, Maxence
dc.contributor.author
Wohlwend, Jelena
dc.contributor.author
Spolenak, Ralph
dc.date.accessioned
2019-12-03T08:22:14Z
dc.date.available
2019-12-03T03:23:09Z
dc.date.available
2019-12-03T08:22:14Z
dc.date.issued
2019-11-13
dc.identifier.other
10.1021/acsami.9b14660
en_US
dc.identifier.uri
http://hdl.handle.net/20.500.11850/382108
dc.language.iso
en
en_US
dc.publisher
American Chemical Society
en_US
dc.subject
thin films
en_US
dc.subject
reactive multilayers
en_US
dc.subject
Ni/Al quenching
en_US
dc.subject
high-speed IR
en_US
dc.subject
thermal management
en_US
dc.title
Thermal Management in Ni/Al Reactive Multilayers: Understanding and Preventing Reaction Quenching on Thin Film Heat Sinks
en_US
dc.type
Journal Article
dc.date.published
2019-11-04
ethz.journal.title
ACS Applied Materials & Interfaces
ethz.journal.volume
11
en_US
ethz.journal.issue
45
en_US
ethz.pages.start
42479
en_US
ethz.pages.end
42485
en_US
ethz.identifier.wos
ethz.publication.place
Washington, DC
en_US
ethz.publication.status
published
en_US
ethz.date.deposited
2019-12-03T03:23:14Z
ethz.source
WOS
ethz.eth
yes
en_US
ethz.availability
Metadata only
en_US
ethz.rosetta.installDate
2019-12-03T08:22:28Z
ethz.rosetta.lastUpdated
2019-12-03T08:22:28Z
ethz.rosetta.versionExported
true
ethz.COinS
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