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dc.contributor.author
Päivänranta, Birgit
dc.contributor.author
Langner, Andreas
dc.contributor.author
Kirk, Eugenie
dc.contributor.author
David, Christian
dc.contributor.author
Ekinci, Yasin
dc.date.accessioned
2017-06-09T13:38:09Z
dc.date.available
2017-06-09T13:38:09Z
dc.date.issued
2011-09
dc.identifier.other
10.1088/0957-4484/22/37/375302
dc.identifier.uri
http://hdl.handle.net/20.500.11850/39496
dc.language.iso
en
dc.publisher
Institute of Physics
dc.title
Sub-10 nm patterning using EUV interference lithography
dc.type
Journal Article
ethz.journal.title
Nanotechnology
ethz.journal.volume
22
ethz.journal.issue
37
ethz.pages.start
375302
ethz.size
7 p.
ethz.notes
Received 22 May 2011, In final form 9 July 2011, Published online 19 August 2011.
ethz.identifier.wos
ethz.identifier.nebis
000552937
ethz.publication.place
Bristol
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::02645 - Institut für Metallforschung / Institute of Metals Research::03661 - Löffler, Jörg F. / Löffler, Jörg F.
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::02645 - Institut für Metallforschung / Institute of Metals Research::03661 - Löffler, Jörg F. / Löffler, Jörg F.
ethz.date.deposited
2017-06-09T13:38:41Z
ethz.source
ECIT
ethz.identifier.importid
imp59364e635972a28520
ethz.ecitpid
pub:63637
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-12T11:55:36Z
ethz.rosetta.lastUpdated
2018-10-01T13:52:31Z
ethz.rosetta.exportRequired
true
ethz.rosetta.versionExported
true
ethz.COinS
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