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dc.contributor.author
Roth, Christian
dc.contributor.author
Sonnenfeld, Axel
dc.contributor.author
Rudolf von Rohr, Philipp
dc.date.accessioned
2017-06-09T17:18:25Z
dc.date.available
2017-06-09T17:18:25Z
dc.date.issued
2011
dc.identifier.isbn
978-1-439-87142-3
dc.identifier.uri
http://hdl.handle.net/20.500.11850/41456
dc.language.iso
en
dc.publisher
CRC Press
dc.subject
Plasma downstream reactor
dc.subject
Surface modification
dc.subject
Low-temperature plasma
dc.subject
Silica, lactose
dc.title
Nanoscale Plasma Surface Modification of Powders
dc.type
Conference Paper
ethz.book.title
Nanotechnology 2011: advanced materials, CNTs, particles, films and composites
ethz.pages.start
225
ethz.pages.end
228
ethz.event
2011 NSTI Nanotechnology Conference and Expo
ethz.event.location
Boston, MA, USA
ethz.event.date
June 13-16, 2011
ethz.notes
.
ethz.publication.place
Boca Raton, FL
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik / Institute of Process Engineering::03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik / Institute of Process Engineering::03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
ethz.date.deposited
2017-06-09T17:18:40Z
ethz.source
ECIT
ethz.identifier.importid
imp59364ea7d03e285076
ethz.ecitpid
pub:69354
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-19T01:36:08Z
ethz.rosetta.lastUpdated
2019-02-02T05:37:01Z
ethz.rosetta.versionExported
true
ethz.COinS
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