EUV brightness, spot size, and contamination measurements at the intermediate focus


Thumbnail
Metadata only
Author
Giovannini, Andrea
Morris, Oran
Henderson, Ian
Abhari, Reza S.
Ellwi, Samir
Show all
Date
2011
Type
  • Conference Paper
Publication status
published
External links
Search via SFX
Editor
Fontaine, Bruno M. la
Naulleau, Patrick P.
Book title
Extreme ultraviolet (EUV) lithography II : 28 February - 3 March 2011, San Jose, California, United States
Journal / series
Proceedings of SPIE
Volume
7969
Pages / Article No.
7969-105
Publisher
SPIE
Event
Conference on Extreme ultraviolet (EUV) lithography II, San Jose, CA, USA, 28 February - 3 March, 2011
Subject
EUV source; LPP; Debris mitigation; Tin droplet; Metrology; Brightness; Actinic mask inspection
Organisational unit
03548 - Abhari, Reza S. / Abhari, Reza S.  
Notes
.
More
Show all metadata
Citations
Cited 3 times in Web of Science
Cited 5 times in Scopus
ETH Bibliography
yes
Altmetrics