EUV brightness, spot size, and contamination measurements at the intermediate focus
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Date
2011Type
- Conference Paper
ETH Bibliography
yes
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Publication status
publishedExternal links
Book title
Extreme ultraviolet (EUV) lithography II : 28 February - 3 March 2011, San Jose, California, United StatesJournal / series
Proceedings of SPIEVolume
Pages / Article No.
Publisher
SPIEEvent
Subject
EUV source; LPP; Debris mitigation; Tin droplet; Metrology; Brightness; Actinic mask inspectionOrganisational unit
03548 - Abhari, Reza S. / Abhari, Reza S.
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ETH Bibliography
yes
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