EUV brightness, spot size, and contamination measurements at the intermediate focus


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Author
Giovannini, Andrea
Morris, Oran
Henderson, Ian
Abhari, Reza S.
Ellwi, Samir
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Date
2011
Type
  • Conference Paper
Publication status
published
External links
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Editor
Fontaine, Bruno M. la
Naulleau, Patrick P.
Book title
Extreme ultraviolet (EUV) lithography II : 28 February - 3 March 2011, San Jose, California, United States
Journal / series
Proceedings of SPIE
Volume
7969
Pages / Article No.
7969-105
Publisher
SPIE
Event
Conference on Extreme ultraviolet (EUV) lithography II, San Jose, CA, USA, 28 February - 3 March, 2011
Subject
EUV source; LPP; Debris mitigation; Tin droplet; Metrology; Brightness; Actinic mask inspection
Organisational unit
03548 - Abhari, Reza S. / Abhari, Reza S.  
Notes
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Citations
Cited 3 times in Web of Science
Cited 4 times in Scopus
ETH Bibliography
yes
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