EUV brightness, spot size, and contamination measurements at the intermediate focus

Metadata only

Author

Date

2011

Type

Conference Paper

ETH Bibliography

yes

Altmetrics

Publication status

published

External links

Editor

Book title

Extreme ultraviolet (EUV) lithography II : 28 February - 3 March 2011, San Jose, California, United States

Journal / series

Proceedings of SPIE

Volume

7969

Pages / Article No.

7969-105

Publisher

SPIE

Event

Conference on Extreme ultraviolet (EUV) lithography II, San Jose, CA, USA, 28 February - 3 March, 2011

Subject

EUV source; LPP; Debris mitigation; Tin droplet; Metrology; Brightness; Actinic mask inspection

Organisational unit

03548 - Abhari, Reza S. / Abhari, Reza S.

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ETH Bibliography

yes

Altmetrics

Research Collection