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dc.contributor.author
Giovannini, Andrea
dc.contributor.author
Morris, Oran
dc.contributor.author
Henderson, Ian
dc.contributor.author
Abhari, Reza S.
dc.contributor.author
Ellwi, Samir
dc.contributor.editor
Fontaine, Bruno M. la
dc.contributor.editor
Naulleau, Patrick P.
dc.date.accessioned
2017-06-09T18:26:13Z
dc.date.available
2017-06-09T18:26:13Z
dc.date.issued
2011
dc.identifier.isbn
978-0-8194-8528-1
dc.identifier.issn
0277-786X
dc.identifier.other
10.1117/12.879598
dc.identifier.uri
http://hdl.handle.net/20.500.11850/44162
dc.language.iso
en
dc.publisher
SPIE
dc.subject
EUV source
dc.subject
LPP
dc.subject
Debris mitigation
dc.subject
Tin droplet
dc.subject
Metrology
dc.subject
Brightness
dc.subject
Actinic mask inspection
dc.title
EUV brightness, spot size, and contamination measurements at the intermediate focus

dc.type
Conference Paper
ethz.book.title
Extreme ultraviolet (EUV) lithography II : 28 February - 3 March 2011, San Jose, California, United States
ethz.journal.title
Proceedings of SPIE
ethz.journal.volume
7969
ethz.journal.abbreviated
Proc. SPIE Int. Soc. Opt. Eng.
ethz.pages.start
7969-105
ethz.size
5 p.
ethz.event
Conference on Extreme ultraviolet (EUV) lithography II
ethz.event.location
San Jose, CA, USA
ethz.event.date
28 February - 3 March, 2011
ethz.identifier.nebis
006580094
ethz.publication.place
Bellingham, WA
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02668 - Inst. f. Energie- und Verfahrenstechnik / Inst. Energy and Process Engineering::03548 - Abhari, Reza S. / Abhari, Reza S.
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02668 - Inst. f. Energie- und Verfahrenstechnik / Inst. Energy and Process Engineering::03548 - Abhari, Reza S. / Abhari, Reza S.
ethz.date.deposited
2017-06-09T18:26:39Z
ethz.source
ECIT
ethz.identifier.importid
imp59364ed626d2f69543
ethz.ecitpid
pub:72956
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-14T15:36:04Z
ethz.rosetta.lastUpdated
2021-02-14T08:22:26Z
ethz.rosetta.versionExported
true
ethz.COinS
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