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dc.contributor.author
Wheeler, Jeffrey M.
dc.contributor.author
Harvey, Cayla
dc.contributor.author
Li, Nan
dc.contributor.author
Misra, Amit
dc.contributor.author
Mara, Nathan A.
dc.contributor.author
Maeder, Xavier
dc.contributor.author
Michler, Johann
dc.contributor.author
Pathak, Siddhartha
dc.date.accessioned
2021-02-15T12:31:07Z
dc.date.available
2021-02-10T13:41:47Z
dc.date.available
2021-02-15T12:31:07Z
dc.date.issued
2021-02-15
dc.identifier.issn
0921-5093
dc.identifier.issn
1873-4936
dc.identifier.other
10.1016/j.msea.2020.140522
en_US
dc.identifier.uri
http://hdl.handle.net/20.500.11850/468887
dc.description.abstract
We examined the high temperature indentation response of physical vapor deposited Cu–TiN multilayered nanocomposites with layer thicknesses ranging from 5 nm to 200 nm. A decrease in hardness with increasing temperature was observed, along with a strong correlation between the hardness and the nanometer-level TiN grain sizes, rather than layer thickness. The apparent activation energies calculated from the high temperature indentation experiments indicated that, for all but the smallest layer thicknesses, the deformation of copper in the nanolaminates dominate the plastic response in these composites. In the finest layer thicknesses, a decrease in the apparent activation energy value indicated possible co-deformation of Cu and TiN. © 2020 Elsevier
en_US
dc.language.iso
en
en_US
dc.publisher
Elsevier
en_US
dc.subject
Indentation
en_US
dc.subject
Nanolaminates
en_US
dc.subject
Multilayers
en_US
dc.subject
High temperature deformation
en_US
dc.subject
Activation energy
en_US
dc.title
High temperature nanoindentation of Cu–TiN nanolaminates
en_US
dc.type
Journal Article
dc.date.published
2020-11-13
ethz.journal.title
Materials Science and Engineering: A
ethz.journal.volume
804
en_US
ethz.pages.start
140522
en_US
ethz.size
7 p.
en_US
ethz.identifier.wos
ethz.identifier.scopus
ethz.publication.place
Amsterdam
en_US
ethz.publication.status
published
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::02645 - Institut für Metallforschung / Institute of Metals Research::03692 - Spolenak, Ralph / Spolenak, Ralph
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::02645 - Institut für Metallforschung / Institute of Metals Research::03692 - Spolenak, Ralph / Spolenak, Ralph
ethz.date.deposited
2021-02-10T13:41:54Z
ethz.source
SCOPUS
ethz.eth
yes
en_US
ethz.availability
Metadata only
en_US
ethz.rosetta.installDate
2021-02-15T12:31:18Z
ethz.rosetta.lastUpdated
2024-02-02T13:05:50Z
ethz.rosetta.versionExported
true
ethz.COinS
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