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dc.contributor.author
Kaushik, Monu
dc.contributor.author
Leroy, César
dc.contributor.author
Chen, Zixuan
dc.contributor.author
Gajan, David
dc.contributor.author
Willinger, Elena
dc.contributor.author
Müller, Christoph R.
dc.contributor.author
Fayon, Franck
dc.contributor.author
Massiot, Dominique
dc.contributor.author
Fedorov, Alexey
dc.contributor.author
Copéret, Christophe
dc.contributor.author
Lesage, Anne
dc.contributor.author
Florian, Pierre
dc.date.accessioned
2022-06-28T10:45:11Z
dc.date.available
2021-06-11T02:26:12Z
dc.date.available
2021-06-16T11:06:19Z
dc.date.available
2022-06-28T10:01:37Z
dc.date.available
2022-06-28T10:45:11Z
dc.date.issued
2021-05-11
dc.identifier.issn
0897-4756
dc.identifier.other
10.1021/acs.chemmater.1c00516
en_US
dc.identifier.uri
http://hdl.handle.net/20.500.11850/489165
dc.identifier.doi
10.3929/ethz-b-000489165
dc.description.abstract
Alumina and aluminosilicates, prepared under various synthesis conditions, play a central role in heterogeneous catalysis with a broad range of industrial applications. We report herein the atomic-scale structure of alumina layers obtained by atomic layer deposition (ALD) of trimethylaluminum onto partially dehydroxylated silica. Such a detailed insight into the atomic structure of the species formed with increasing Al content was gained using a variety of one- and two-dimensional solid-state nuclear magnetic resonance (NMR) experiments involving 27Al, 1H, and 29Si nuclei. Multicomponent fittings of the 1D and 2D experimental data sets allowed us to show that at 3.4 wt % of deposited Al, a submonolayer containing [4]Al(3Si), [4]Al(4Si), and [5]Al(2Si) species forms on the silica surface, with most of these sites carrying OH groups. The films obtained after additional ALD cycles (depositing 9.2 or 15.4 wt % Al) feature characteristics of an amorphous alumina phase with a high concentration of [5]Al species and abundant OH groups. The most probable species at the interface between silica and alumina are [4]Al(2Si), [4]Al(3Si), and [5]Al(2Si). 15N dynamic nuclear polarization surface-enhanced NMR spectroscopy (15N DNP SENS) and infrared spectroscopy using 15N-labeled pyridine as a probe molecule reveal that aluminum oxide layers on amorphous silica contain both strong Brønsted and strong Lewis acid sites, whereby the relative abundance and nature of these sites, and therefore the acidity of the surface, evolve with increasing thickness of the alumina films (controlled by the number of ALD cycles). This study provides the first in-depth atomic-scale description of (sub-)nanometer-scale aluminum oxide films prepared by ALD as a function of their growth on a partially dehydroxylated silica support, opening the way to molecular-level understanding of the catalytic activity of such heterogeneous catalysts with tailored acidity.
en_US
dc.format
application/pdf
en_US
dc.language.iso
en
en_US
dc.publisher
American Chemical Society
en_US
dc.rights.uri
http://creativecommons.org/licenses/by/4.0/
dc.title
Atomic-Scale Structure and Its Impact on Chemical Properties of Aluminum Oxide Layers Prepared by Atomic Layer Deposition on Silica
en_US
dc.type
Journal Article
dc.rights.license
Creative Commons Attribution 4.0 International
dc.date.published
2021-04-23
ethz.journal.title
Chemistry of Materials
ethz.journal.volume
33
en_US
ethz.journal.issue
9
en_US
ethz.journal.abbreviated
Chem. Mater.
ethz.pages.start
3335
en_US
ethz.pages.end
3348
en_US
ethz.size
14 p. accepted version
en_US
ethz.version.deposit
acceptedVersion
en_US
ethz.grant
Advanced materials by atomic layer deposition (ALD): from controlling porosity of ALD-grown overcoats to the molecular understanding of silica-aluminas
en_US
ethz.grant
Advancing CO2 Capture Materials by Atomic Scale Design: the Quest for Understanding
en_US
ethz.identifier.wos
ethz.identifier.scopus
ethz.publication.place
Washington, DC
en_US
ethz.publication.status
published
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02668 - Inst. f. Energie- und Verfahrenstechnik / Inst. Energy and Process Engineering::03865 - Müller, Christoph R. / Müller, Christoph R.
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02020 - Dep. Chemie und Angewandte Biowiss. / Dep. of Chemistry and Applied Biosc.::02513 - Laboratorium für Anorganische Chemie / Laboratory of Inorganic Chemistry::03872 - Copéret, Christophe / Copéret, Christophe
en_US
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02668 - Inst. f. Energie- und Verfahrenstechnik / Inst. Energy and Process Engineering::03865 - Müller, Christoph R. / Müller, Christoph R.
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02020 - Dep. Chemie und Angewandte Biowiss. / Dep. of Chemistry and Applied Biosc.::02513 - Laboratorium für Anorganische Chemie / Laboratory of Inorganic Chemistry::03872 - Copéret, Christophe / Copéret, Christophe
en_US
ethz.grant.agreementno
ETH-40 17-2
ethz.grant.agreementno
819573
ethz.grant.fundername
ETHZ
ethz.grant.fundername
EC
ethz.grant.funderDoi
10.13039/501100003006
ethz.grant.funderDoi
10.13039/501100000780
ethz.grant.program
ETH Grants
ethz.grant.program
H2020
ethz.date.deposited
2021-06-11T02:26:16Z
ethz.source
SCOPUS
ethz.eth
yes
en_US
ethz.availability
Open access
en_US
ethz.rosetta.installDate
2021-06-16T11:06:27Z
ethz.rosetta.lastUpdated
2023-02-07T03:50:55Z
ethz.rosetta.versionExported
true
ethz.COinS
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