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dc.contributor.author
Fritze, Stefan
dc.contributor.author
Chen, Ming
dc.contributor.author
Riekehr, Lars
dc.contributor.author
Osinger, Barbara
dc.contributor.author
Sortica, Maurício A.
dc.contributor.author
Srinath, Aishwarya
dc.contributor.author
Menon, Ashok S.
dc.contributor.author
Lewin, Erik
dc.contributor.author
Primetzhofer, Daniel
dc.contributor.author
Wheeler, Jeffrey
dc.contributor.author
Jansson, Ulf
dc.date.accessioned
2021-07-09T14:49:32Z
dc.date.available
2021-06-28T04:06:39Z
dc.date.available
2021-07-09T14:49:32Z
dc.date.issued
2021-10
dc.identifier.issn
0264-1275
dc.identifier.issn
1873-4197
dc.identifier.other
10.1016/j.matdes.2021.109874
en_US
dc.identifier.uri
http://hdl.handle.net/20.500.11850/491586
dc.identifier.doi
10.3929/ethz-b-000491586
dc.description.abstract
Tungsten (W)-based materials attract significant attention due to their superior mechanical properties. Here, we present a chemical approach based on the addition of carbon (C) for increased strength via the combination of three strengthening mechanisms in W thin films. W:C thin films with C concentrations up to ~4 at.% were deposited by magnetron sputtering. All films exhibit a body-centred-cubic structure with strong <hh0> texture and columnar growth behaviour. X-ray and electron diffraction measurements suggest the formation of supersaturated W:C solid solution phases. The addition of C reduced the average column width from ~133 nm for W to ~20 nm for the film containing ~4 at.% C. The column refinement is explained by a mechanism where C acts as re-nucleation sites. The W film is ~13 GPa hard, while the W:C films achieve a peak hardness of ~24 GPa. The W:C films are ~11 GPa harder than the W film, which is explained by a combination of grain refinement strengthening, solid solution strengthening and increased dislocation density. Additional micropillar compression tests showed that the flow stress increased upon C addition, from ~3.8 to ~8.3 GPa and no brittle fracture was observed.
en_US
dc.format
application/pdf
en_US
dc.language.iso
en
en_US
dc.publisher
Elsevier
en_US
dc.rights.uri
http://creativecommons.org/licenses/by/4.0/
dc.subject
Small-scale mechanical characterisation
en_US
dc.subject
Tungsten
en_US
dc.subject
PVD
en_US
dc.subject
Supersaturated solid solution
en_US
dc.title
Magnetron sputtering of carbon supersaturated tungsten films – A chemical approach to increase strength
en_US
dc.type
Journal Article
dc.rights.license
Creative Commons Attribution 4.0 International
dc.date.published
2021-06-15
ethz.journal.title
Materials & Design
ethz.journal.volume
208
en_US
ethz.journal.abbreviated
Mater. des.
ethz.pages.start
109874
en_US
ethz.size
10 p.
en_US
ethz.version.deposit
publishedVersion
en_US
ethz.identifier.wos
ethz.identifier.scopus
ethz.publication.place
Amsterdam
en_US
ethz.publication.status
published
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::02645 - Institut für Metallforschung / Institute of Metals Research::03692 - Spolenak, Ralph / Spolenak, Ralph
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::02645 - Institut für Metallforschung / Institute of Metals Research::03692 - Spolenak, Ralph / Spolenak, Ralph
ethz.date.deposited
2021-06-28T04:06:42Z
ethz.source
SCOPUS
ethz.eth
yes
en_US
ethz.availability
Open access
en_US
ethz.rosetta.installDate
2021-07-09T14:49:38Z
ethz.rosetta.lastUpdated
2022-03-29T10:21:28Z
ethz.rosetta.versionExported
true
ethz.COinS
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