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dc.contributor.author
Wüest, Robert
dc.contributor.author
Hunziker, Christoph
dc.contributor.author
Robin, Franck
dc.contributor.author
Strasser, Patric
dc.contributor.author
Erni, Daniel
dc.contributor.author
Jäckel, Heinz
dc.date.accessioned
2017-06-10T02:52:55Z
dc.date.available
2017-06-10T02:52:55Z
dc.date.issued
2004
dc.identifier.isbn
0-8194-5170-3
dc.identifier.issn
0277-786X
dc.identifier.other
10.1117/12.522316
dc.identifier.uri
http://hdl.handle.net/20.500.11850/52288
dc.language.iso
en
dc.publisher
SPIE
dc.subject
Photonic crystal
dc.subject
Electron-beam lithography
dc.subject
Proximity-effect correction
dc.subject
Electron-beam simulation
dc.subject
Hole-size variation
dc.subject
Energy intensity distribution
dc.subject
Proximity-effect parameter-measurement
dc.title
Limitations of proximity-effect correction for electron-beam patterning of photonic crystals
dc.type
Conference Paper
ethz.book.title
Photonics: design, technology, and packaging : 10-12 December 2003, Perth, Australia
ethz.journal.title
Proceedings of SPIE
ethz.journal.volume
5277
ethz.journal.abbreviated
Proc. SPIE Int. Soc. Opt. Eng.
ethz.pages.start
186
ethz.pages.end
197
ethz.event
Conference on Photonics - Design, Technology and Packaging
ethz.event.location
Perth, Australia
ethz.event.date
December 10-12, 2003
ethz.notes
.
ethz.identifier.wos
ethz.identifier.nebis
004731216
ethz.publication.place
Bellingham, Washington
ethz.publication.status
published
ethz.leitzahl
03386 - Jäckel, Heinz
ethz.leitzahl.certified
03386 - Jäckel, Heinz
ethz.date.deposited
2017-06-10T02:53:58Z
ethz.source
ECIT
ethz.identifier.importid
imp59364f7b6860d17534
ethz.ecitpid
pub:84992
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-19T07:59:00Z
ethz.rosetta.lastUpdated
2018-08-02T10:04:45Z
ethz.rosetta.versionExported
true
ethz.COinS
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