Influence of etching parameters on the redeposition in lithium niobate thin film circuits
dc.contributor.author
Kaufmann, Fabian
dc.contributor.author
Pohl, David
dc.contributor.author
Reig Escalé, Marc
dc.contributor.author
Maeder, Andreas
dc.contributor.author
Grange, Rachel
dc.date.accessioned
2022-06-28T13:17:44Z
dc.date.available
2022-01-10T14:05:32Z
dc.date.available
2022-06-28T08:04:27Z
dc.date.available
2022-06-28T13:17:44Z
dc.date.issued
2021
dc.identifier.uri
http://hdl.handle.net/20.500.11850/524303
dc.language.iso
en
en_US
dc.publisher
Nanofab-net
en_US
dc.title
Influence of etching parameters on the redeposition in lithium niobate thin film circuits
en_US
dc.type
Other Conference Item
ethz.book.title
Nanofab POM abstract book
en_US
ethz.pages.start
33
en_US
ethz.pages.end
33
en_US
ethz.event
Nanofab Photonics Online Meetup
en_US
ethz.event.location
Online
en_US
ethz.event.date
May 16-18, 2021
en_US
ethz.notes
Poster abstract ; Poster presented on May 17, 2021
en_US
ethz.publication.place
Lausanne
en_US
ethz.publication.status
published
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02010 - Dep. Physik / Dep. of Physics::02510 - Institut für Quantenelektronik / Institute for Quantum Electronics::09531 - Grange, Rachel / Grange, Rachel
en_US
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02010 - Dep. Physik / Dep. of Physics::02510 - Institut für Quantenelektronik / Institute for Quantum Electronics::09531 - Grange, Rachel / Grange, Rachel
en_US
ethz.relation.references
https://twitter.com/ong_ethz/status/1394195174226632704
ethz.date.deposited
2022-01-10T14:05:39Z
ethz.source
FORM
ethz.eth
yes
en_US
ethz.availability
Metadata only
en_US
ethz.rosetta.installDate
2022-06-28T08:04:35Z
ethz.rosetta.lastUpdated
2023-02-07T03:51:22Z
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true
ethz.rosetta.versionExported
true
ethz.COinS
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Other Conference Item [19758]