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dc.contributor.author
Martin, O.F.J.
dc.date.accessioned
2017-06-10T08:24:22Z
dc.date.available
2017-06-10T08:24:22Z
dc.date.issued
2003-06
dc.identifier.issn
0167-9317
dc.identifier.issn
1873-5568
dc.identifier.other
10.1016/S0167-9317(03)00167-9
dc.identifier.uri
http://hdl.handle.net/20.500.11850/54993
dc.language.iso
en
dc.publisher
Elsevier
dc.subject
Surface plasmons
dc.subject
Contact lithography
dc.subject
Contrast mechanism
dc.subject
Scattering calculation
dc.title
Surface plasmon illumination scheme for contact lithography beyond the diffraction limit
dc.type
Other Conference Item
ethz.journal.title
Microelectronic Engineering
ethz.journal.volume
67-8
ethz.journal.abbreviated
Microelectron. eng.
ethz.pages.start
24
ethz.pages.end
30
ethz.event
28th International Conference on Micro- and Nano-Engineering
ethz.event.location
Lugano, Switzerland
ethz.event.date
16-19 September, 2002
ethz.notes
.
ethz.identifier.wos
ethz.identifier.nebis
000022878
ethz.publication.place
Amsterdam , Netherlands
ethz.publication.status
published
ethz.date.deposited
2017-06-10T08:24:32Z
ethz.source
ECIT
ethz.identifier.importid
imp59364fb48ede078110
ethz.ecitpid
pub:88673
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-14T17:40:20Z
ethz.rosetta.lastUpdated
2018-08-02T10:26:03Z
ethz.rosetta.versionExported
true
ethz.COinS
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