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dc.contributor.author
Wang, Li
dc.contributor.author
Terhalle, Bernd
dc.contributor.author
Guzenko, Vitaliy A.
dc.contributor.author
Farhan, Alan
dc.contributor.author
Hojeij, Mohamad
dc.contributor.author
Ekinci, Yasin
dc.date.accessioned
2017-06-10T09:28:03Z
dc.date.available
2017-06-10T09:28:03Z
dc.date.issued
2012-08
dc.identifier.issn
0003-6951
dc.identifier.issn
1077-3118
dc.identifier.other
10.1063/1.4748758
dc.identifier.uri
http://hdl.handle.net/20.500.11850/56223
dc.language.iso
en
dc.publisher
American Institute of Physics
dc.title
Generation of high-resolution kagome lattice structures using extreme ultraviolet interference lithography
dc.type
Journal Article
ethz.journal.title
Applied Physics Letters
ethz.journal.volume
101
ethz.journal.issue
9
ethz.journal.abbreviated
Appl. Phys. Lett.
ethz.pages.start
093104
ethz.size
5 p.
ethz.notes
Received 5 July 2012, Accepted 14 August 2012, Published online 27 August 2012.
ethz.identifier.wos
ethz.identifier.nebis
000038985
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::02645 - Institut für Metallforschung / Institute of Metals Research::03661 - Löffler, Jörg F. / Löffler, Jörg F.
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::02645 - Institut für Metallforschung / Institute of Metals Research::03661 - Löffler, Jörg F. / Löffler, Jörg F.
ethz.date.deposited
2017-06-10T09:29:33Z
ethz.source
ECIT
ethz.identifier.importid
imp59364fce65b0b68608
ethz.ecitpid
pub:90463
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-14T17:54:16Z
ethz.rosetta.lastUpdated
2024-02-01T19:27:51Z
ethz.rosetta.exportRequired
true
ethz.rosetta.versionExported
true
ethz.COinS
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