Crack-free yttria stabilized zirconia thin films by aerosol assisted chemical vapor deposition
Influence of water and carrier gas
Metadata only
Date
2012-11Type
- Journal Article
ETH Bibliography
yes
Altmetrics
Publication status
publishedExternal links
Journal / series
Thin Solid FilmsVolume
Pages / Article No.
Publisher
ElsevierSubject
Aerosol assisted chemical vapor deposition; Yttria stabilized zirconia; Process conditions; Deposition atmosphere; Water; Crack formationOrganisational unit
03270 - Gauckler, Ludwig J.
Notes
Received 19 November 2011, Accepted 13 September 2012, Available online 24 September 2012.More
Show all metadata
ETH Bibliography
yes
Altmetrics