Top-down fabricated silicon nanowires under tensile elastic strain up to 4.5% - Research Collection

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Author

Minamisawa, Renato A.

Süess, Martin J.

Spolenak, Ralph

Faist, Jérôme

David, Christian

Bourdelle, Konstantin K.

Date

2012

Type

Journal Article

ETH Bibliography

yes

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Publication status

published

External links

https://doi.org/10.1038/ncomms2102

Journal / series

Nature Communications

Volume

3

Pages / Article No.

1096

Publisher

Nature

Organisational unit

03692 - Spolenak, Ralph / Spolenak, Ralph
03759 - Faist, Jérôme / Faist, Jérôme

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ETH Bibliography

yes

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