Self-alignment techniques for fabricating a-Si TFTs at 300 oC on clear plastic
dc.contributor.author
Cherenack, Kunigunde H.
dc.contributor.author
Hekmatshoar, Bahman
dc.contributor.author
Wagner, Sigurd
dc.contributor.author
Sturm, James C.
dc.date.accessioned
2017-06-10T16:03:58Z
dc.date.available
2017-06-10T16:03:58Z
dc.date.issued
2009-03
dc.identifier.uri
http://hdl.handle.net/20.500.11850/65860
dc.language.iso
en
dc.publisher
Ecole Polytechnique
dc.title
Self-alignment techniques for fabricating a-Si TFTs at 300 oC on clear plastic
dc.type
Conference Paper
ethz.journal.title
Proceedings of the 5th International Thin Film Transistor (TFT) Conference
ethz.pages.start
9.5
ethz.size
4 p.
ethz.event
5th International Thin Film Transistor (TFT) Conference
ethz.event.location
Palaiseau, France
ethz.event.date
March 5-6, 2009
ethz.publication.place
Palaiseau, France
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02140 - Dep. Inf.technologie und Elektrotechnik / Dep. of Inform.Technol. Electrical Eng.::02634 - Institut für Elektronik / Institute for Electronics::03388 - Tröster, Gerhard (emeritus)
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02140 - Dep. Inf.technologie und Elektrotechnik / Dep. of Inform.Technol. Electrical Eng.::02634 - Institut für Elektronik / Institute for Electronics::03388 - Tröster, Gerhard (emeritus)
ethz.date.deposited
2017-06-10T16:04:26Z
ethz.source
ECIT
ethz.identifier.importid
imp59365084350f454507
ethz.ecitpid
pub:105020
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-17T07:38:34Z
ethz.rosetta.lastUpdated
2020-02-14T11:56:07Z
ethz.rosetta.versionExported
true
ethz.COinS
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Conference Paper [33086]