Surface erosion induced by heavy ion backscattering analysis

Abstract

Material removal induced by HIBS (Heavy Ion Backscattering Spectrometry) analysis has been investigated. For this purpose the thickness of thin metal films deposited on graphite was measured as a function of fluence of the Si and Ti projectile ion beam. Steady state erosion rates are in fair agreement with surface sputtering rates calculated by SRIM. For some layers however, the first few monolayers are removed at a much faster rate. A comparison with standard He RBS is made and consequences for the applicability of HIBS are discussed.