Multiscale simulation of aluminum thin films for the design of highly-reliable MEMS devices
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Date
2009Type
- Conference Paper
ETH Bibliography
yes
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Abstract
A multiscale simulation methodology is presented to predict the macroscopic mechanical properties of aluminum thin films with a columnar grain structure from the morphology at microscopic scale. The elasto–plastic characteristics of the thin films are calculated as a function of the grain size, temperature, and strain rate by taking into account creep phenomena. The simulated data are validated by experimental stress–strain curves measured by dedicated microstructures in conjunction with a nanoindentation test equipment. Show more
Publication status
publishedExternal links
Journal / series
Microelectronics ReliabilityVolume
Pages / Article No.
Publisher
ElsevierEvent
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ETH Bibliography
yes
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