Suppression of resist contamination during photolithography on carbon nanomaterials by a sacrificial layer
Metadata only
Date
2014-01Type
- Journal Article
Publication status
publishedExternal links
Journal / series
CarbonVolume
Pages / Article No.
Publisher
ElsevierOrganisational unit
03609 - Hierold, Christofer / Hierold, Christofer
Notes
Received 27 February 2013, Accepted 4 September 2013, Published online 11 September 2013.More
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