PECVD of SıOx films from oxygen and hexamethyldisiloxane in a double source reactor
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Date
2006Type
- Doctoral Thesis
ETH Bibliography
yes
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https://doi.org/10.3929/ethz-a-005151598Publication status
publishedExternal links
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Publisher
ETHSubject
SILICON OXIDES (INORGANIC CHEMISTRY); SILICIUMOXIDE (ANORGANISCHE CHEMIE); EIGENSCHAFTEN DÜNNER SCHICHTEN (PHYSIK VON MOLEKULARSYSTEMEN); CHEMICAL VAPOUR DEPOSITION, CVD (PRODUCTION ENGINEERING); PROPERTIES OF THIN LAYERS (PHYSICS OF MOLECULAR SYSTEMS); CHEMISCHE BESCHICHTUNGEN AUS DER GASPHASE, CVD (PRODUKTIONSTECHNIK)Organisational unit
03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
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ETH Bibliography
yes
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