UV Absorptance of Titanium Dioxide Thin Films by Plasma Enhanced Deposition from Mixtures of Oxygen and Titanium-Tetrakis-Isopropoxide

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Author
Sonnenfeld, Axel
Rudolf von Rohr, Philipp
Hauert, Roland
Date
2006-06
Type
    Journal Article
Rights / license
In Copyright - Non-Commercial Use Permitted
Permanent link
https://doi.org/10.3929/ethz-b-000000776
Publication status
published
External links
Journal / series
Plasma chemistry and plasma processing
Volume
26(3)
Pages / Article No.
319 - 334
Publisher
Springer
Subject
Titanium dioxide; Plasma enhanced chemical vapour deposition (PECVD); Polymeric substrate; UV absorption; XPS
Organisational unit
03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)  
Notes
Received 27 October 2005, Accepted 2 February 2006, Published online 7 April 2006. It was possible to publish this article open access thanks to a Swiss National Licence with the publisher
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Cited 17 times in Web of Science
ETH Bibliography
yes
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