UV Absorptance of Titanium Dioxide Thin Films by Plasma Enhanced Deposition from Mixtures of Oxygen and Titanium-Tetrakis-Isopropoxide

Open access
Date
2006-06Type
- Journal Article
Permanent link
https://doi.org/10.3929/ethz-b-000000776Publication status
publishedExternal links
Journal / series
Plasma chemistry and plasma processingVolume
Pages / Article No.
Publisher
SpringerSubject
Titanium dioxide; Plasma enhanced chemical vapour deposition (PECVD); Polymeric substrate; UV absorption; XPSOrganisational unit
03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
Notes
Received 27 October 2005, Accepted 2 February 2006, Published online 7 April 2006. It was possible to publish this article open access thanks to a Swiss National Licence with the publisherMore
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