UV Absorptance of Titanium Dioxide Thin Films by Plasma Enhanced Deposition from Mixtures of Oxygen and Titanium-Tetrakis-Isopropoxide

Thumbnail
Metadata only
Author
Sonnenfeld, Axel
Rudolf von Rohr, Philipp
Hauert, Roland
Date
2006-06
Type
  • Journal Article
Publication status
published
External links
Full text via SFX
Journal / series
Plasma chemistry and plasma processing
Volume
26(3)
Pages
319 - 334
Publisher
Springer
Subject
Titanium dioxide; Plasma enhanced chemical vapour deposition (PECVD); Polymeric substrate; UV absorption; XPS
Organisational unit
03348 - Rudolf von Rohr, Philipp
Notes
Received 27 October 2005, Accepted 2 February 2006, Published online 7 April 2006.
More
Show all metadata
Altmetrics