UV Absorptance of Titanium Dioxide Thin Films by Plasma Enhanced Deposition from Mixtures of Oxygen and Titanium-Tetrakis-Isopropoxide - Research Collection

Metadata only

Author

Sonnenfeld, Axel

Rudolf von Rohr, Philipp

Hauert, Roland

Date

2006-06

Type

Journal Article

Citations

Cited 16 times in Web of Science

ETH Bibliography

yes

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Publication status

published

External links

https://doi.org/10.1007/s11090-006-9022-6

Journal / series

Plasma chemistry and plasma processing

Volume

26(3)

Pages / Article No.

319 - 334

Publisher

Springer

Subject

Titanium dioxide; Plasma enhanced chemical vapour deposition (PECVD); Polymeric substrate; UV absorption; XPS

Organisational unit

03348 - Rudolf von Rohr, Philipp / Rudolf von Rohr, Philipp

Notes

Received 27 October 2005, Accepted 2 February 2006, Published online 7 April 2006.

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Citations

Cited 16 times in Web of Science

ETH Bibliography

yes

Altmetrics