UV Absorptance of Titanium Dioxide Thin Films by Plasma Enhanced Deposition from Mixtures of Oxygen and Titanium-Tetrakis-Isopropoxide
Metadata only
Date
2006-06Type
- Journal Article
Publication status
publishedJournal / series
Plasma chemistry and plasma processingVolume
Pages / Article No.
Publisher
SpringerSubject
Titanium dioxide; Plasma enhanced chemical vapour deposition (PECVD); Polymeric substrate; UV absorption; XPSOrganisational unit
03348 - Rudolf von Rohr, Philipp
Notes
Received 27 October 2005, Accepted 2 February 2006, Published online 7 April 2006.More
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