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dc.contributor.author
Rollinger, B.
dc.contributor.author
Giovannini, A. Z.
dc.contributor.author
Gambino, N.
dc.contributor.author
Bozinova, L.
dc.contributor.author
Hertig, K.
dc.contributor.author
Abhari, Reza S.
dc.date.accessioned
2017-06-11T03:00:43Z
dc.date.available
2017-06-11T03:00:43Z
dc.date.issued
2013
dc.identifier.uri
http://hdl.handle.net/20.500.11850/78090
dc.language.iso
en
dc.title
LPP Light Source for High Volume Production and Scalability
dc.type
Other Conference Item
ethz.journal.title
2013 International Symposium on EUV Lithography
ethz.event
International Symposium on EUV Lithography
ethz.event.location
Toyama, Japan
ethz.event.date
October 6-10, 2013
ethz.notes
Published online.
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02627 - Institut für Energietechnik / Institute of Energy Technology::03548 - Abhari, Reza S. / Abhari, Reza S.
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02627 - Institut für Energietechnik / Institute of Energy Technology
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02627 - Institut für Energietechnik / Institute of Energy Technology::03548 - Abhari, Reza S. / Abhari, Reza S.
ethz.date.deposited
2017-06-11T03:03:25Z
ethz.source
ECIT
ethz.identifier.importid
imp5936517599e5e36540
ethz.ecitpid
pub:123014
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-19T01:42:33Z
ethz.rosetta.lastUpdated
2018-11-02T12:45:29Z
ethz.rosetta.versionExported
true
ethz.COinS
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