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dc.contributor.author
Lee, Shih-Wei
dc.contributor.author
Muoth, Matthias
dc.contributor.author
Hierold, Christofer
dc.date.accessioned
2017-06-11T08:48:37Z
dc.date.available
2017-06-11T08:48:37Z
dc.date.issued
2014-05
dc.identifier.other
10.1088/0957-4484/25/21/215301
dc.identifier.uri
http://hdl.handle.net/20.500.11850/84454
dc.language.iso
en
dc.publisher
Institute of Physics
dc.subject
Integration
dc.subject
Suspended
dc.subject
Nanotube
dc.subject
MEMS
dc.subject
Photolithography
dc.title
Photomask-based integration process of low-defect suspended carbon nanotubes into SOI MEMS
dc.type
Journal Article
ethz.journal.title
Nanotechnology
ethz.journal.volume
25
ethz.journal.issue
21
ethz.pages.start
215301
ethz.size
11 p.
ethz.notes
Received 18 September 2013, accepted for publication 1 April 2014, Published 2 May 2014.
ethz.identifier.wos
ethz.identifier.nebis
000552937
ethz.publication.place
Bristol
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::03609 - Hierold, Christofer / Hierold, Christofer
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::03609 - Hierold, Christofer / Hierold, Christofer
ethz.date.deposited
2017-06-11T08:52:32Z
ethz.source
ECIT
ethz.identifier.importid
imp593651ec998a918657
ethz.ecitpid
pub:133244
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-12T23:52:45Z
ethz.rosetta.lastUpdated
2020-02-14T13:40:09Z
ethz.rosetta.versionExported
true
ethz.COinS
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