Bit-array patterns with density over 1 Tbit/in.2 fabricated by extreme ultraviolet interference lithography
Solak, Harun H.
- Journal Article
Journal / seriesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Pages / Article No.
PublisherAmerican Institute of Physics
SubjectArrays; Density; Nanolithography; Nanopatterning; Storage media; Ultraviolet lithography
Organisational unit03661 - Löffler, Jörg F. / Löffler, Jörg F.
NotesReceived 10 June 2007, Accepted 24 September 2007, Published 7 December 2007.
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