New Integrated Monte Carlo Code for the Simulation of High-Resolution Scanning Electron Microscopy Images for Metrology in Microlithography

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Author

Date

2014

Type

Conference Paper

ETH Bibliography

yes

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Publication status

published

External links

Editor

Book title

Metrology inspection and process control for microlithography XXVIII : 24-27 February 2014, San Jose, California, United States

Journal / series

Proceedings of SPIE

Volume

9050

Pages / Article No.

90500I

Publisher

SPIE

Event

Conference on Metrology, Inspection, and Process Control for Microlithography XXVIII, San Jose, CA, USA, February 24-27, 2014

Subject

CD extraction; CD-SEM; Monte Carlo simulation; Dose calculation; Self charging

Organisational unit

03380 - Huang, Qiuting (emeritus) / Huang, Qiuting (emeritus)

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ETH Bibliography

yes

Altmetrics

Research Collection