Exploring the limits of scanning electron microscopy for the metrology of critical dimensions of photoresist structures in the nanometer range
Illarionov, Alexey Yu.
- Journal Article
Journal / seriesMicroelectronics reliability
SubjectScanning electron microscopy; Monte Carlo simulation; Metrology of nano structures
Organisational unit03380 - Huang, Qiuting
NotesReceived 26 June 2014, Accepted 8 July 2014, Available online 10 August 2014.
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