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dc.contributor.author
Ohata, Masaki
dc.contributor.author
Tabersky, Daniel
dc.contributor.author
Glaus, Reto
dc.contributor.author
Koch, Joachim
dc.contributor.author
Hattendorf, Bodo
dc.contributor.author
Günther, Detlef
dc.date.accessioned
2017-06-11T11:59:50Z
dc.date.available
2017-06-11T11:59:50Z
dc.date.issued
2014-08
dc.identifier.other
10.1039/c4ja00030g
dc.identifier.uri
http://hdl.handle.net/20.500.11850/88189
dc.language.iso
en
dc.publisher
Royal Society of Chemistry
dc.title
Comparison of 795 nm and 265 nm femtosecond and 193 nm nanosecond laser ablation inductively coupled plasma mass spectrometry for the quantitative multi-element analysis of glass materials
dc.type
Journal Article
ethz.journal.title
Journal of analytical atomic spectrometry
ethz.journal.volume
29
ethz.journal.issue
8
ethz.pages.start
1345
ethz.pages.end
1353
ethz.notes
Received 23 January 2014, Accepted 15 April 2014.
ethz.identifier.wos
ethz.identifier.nebis
000033220
ethz.publication.place
Cambridge
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02020 - Dep. Chemie und Angewandte Biowiss. / Dep. of Chemistry and Applied Biosc.::02513 - Laboratorium für Anorganische Chemie / Laboratory of Inorganic Chemistry::03512 - Günther, Detlef / Günther, Detlef
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02020 - Dep. Chemie und Angewandte Biowiss. / Dep. of Chemistry and Applied Biosc.::02513 - Laboratorium für Anorganische Chemie / Laboratory of Inorganic Chemistry::03512 - Günther, Detlef / Günther, Detlef
ethz.date.deposited
2017-06-11T12:00:31Z
ethz.source
ECIT
ethz.identifier.importid
imp593652369818496801
ethz.ecitpid
pub:138784
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-14T12:48:02Z
ethz.rosetta.lastUpdated
2020-02-14T14:05:57Z
ethz.rosetta.versionExported
true
ethz.COinS
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