Clean and Stable LPP Light Source for HVM Inspection Applications

Metadata only

Author

Date

2014-04

Type

Conference Paper

ETH Bibliography

yes

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Publication status

published

External links

Book title

Extreme Ultraviolet (Euv) Lithography V

Journal / series

Proceedings of SPIE

Volume

9048

Pages / Article No.

90482K-1 - 90482K-9

Publisher

SPIE

Event

Conference on Extreme Ultraviolet (EUV) Lithography V, San Jose, CA, USA, February 24-27, 2014

Subject

EUV source; LPP; EUVL; Optical lithography; Droplets; Tin

Organisational unit

03548 - Abhari, Reza S. / Abhari, Reza S.

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ETH Bibliography

yes

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Research Collection