Clean and Stable LPP Light Source for HVM Inspection Applications

Metadata only

Autor(in)

Datum

2014-04

Typ

Conference Paper

ETH Bibliographie

yes

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Publikationsstatus

published

Externe Links

Buchtitel

Extreme Ultraviolet (Euv) Lithography V

Zeitschrift / Serie

Proceedings of SPIE

Band

9048

Seiten / Artikelnummer

90482K-1 - 90482K-9

Verlag

SPIE

Konferenz

Conference on Extreme Ultraviolet (EUV) Lithography V, San Jose, CA, USA, February 24-27, 2014

Thema

EUV source; LPP; EUVL; Optical lithography; Droplets; Tin

Organisationseinheit

03548 - Abhari, Reza S. / Abhari, Reza S.

Mehr

ETH Bibliographie

yes

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Research Collection