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dc.contributor.author
Kalkman, J.
dc.contributor.author
de Bres, E.
dc.contributor.author
Polman, A.
dc.contributor.author
Norris, D.J.
dc.contributor.author
Hart, D.C. ‘t
dc.contributor.author
Hoogenboom, J.P.
dc.contributor.author
Blaaderen, A. van
dc.date.accessioned
2017-06-11T16:32:03Z
dc.date.available
2017-06-11T16:32:03Z
dc.date.issued
2004-03
dc.identifier.issn
0021-8979
dc.identifier.issn
1089-7550
dc.identifier.other
10.1063/1.1640459
dc.identifier.uri
http://hdl.handle.net/20.500.11850/99014
dc.language.iso
en
dc.publisher
American Institute of Physics
dc.title
Selective excitation of erbium in silicon-infiltrated silica colloidal photonic crystals
dc.type
Journal Article
ethz.journal.title
Journal of Applied Physics
ethz.journal.volume
95
ethz.journal.issue
5
ethz.journal.abbreviated
J. appl. physi.
ethz.pages.start
2297
ethz.pages.end
2302
ethz.notes
Received 16 September 2003, Accepted 18 November 2003.
ethz.identifier.wos
ethz.identifier.nebis
000037502
ethz.publication.place
Melville, NY
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik / Institute of Process Engineering::03875 - Norris, David J. / Norris, David J.
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik / Institute of Process Engineering::03875 - Norris, David J. / Norris, David J.
ethz.date.deposited
2017-06-11T16:32:10Z
ethz.source
ECIT
ethz.identifier.importid
imp593653011da9c98531
ethz.ecitpid
pub:154951
ethz.eth
no
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-15T02:29:26Z
ethz.rosetta.lastUpdated
2018-11-02T18:35:08Z
ethz.rosetta.versionExported
true
ethz.COinS
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