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dc.contributor.author
Norris, David J.
dc.contributor.author
Vlasov, Yurii A.
dc.date.accessioned
2017-06-11T16:33:43Z
dc.date.available
2017-06-11T16:33:43Z
dc.date.issued
2001-03-16
dc.identifier.issn
0935-9648
dc.identifier.issn
1521-4095
dc.identifier.other
10.1002/1521-4095(200103)13:6<371::AID-ADMA371>3.0.CO;2-K
dc.identifier.uri
http://hdl.handle.net/20.500.11850/99024
dc.language.iso
en
dc.publisher
Wiley-VCH
dc.title
Chemical approaches to three-dimensional semiconductor photonic crystals
dc.type
Review Article
ethz.journal.title
Advanced Materials
ethz.journal.volume
13
ethz.journal.issue
6
ethz.journal.abbreviated
Adv Mater
ethz.pages.start
371
ethz.pages.end
376
ethz.notes
Published online 15 March 2001.
ethz.identifier.wos
ethz.identifier.nebis
000504408
ethz.publication.place
Weinheim
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik / Institute of Process Engineering::03875 - Norris, David J. / Norris, David J.
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik / Institute of Process Engineering::03875 - Norris, David J. / Norris, David J.
ethz.date.deposited
2017-06-11T16:34:41Z
ethz.source
ECIT
ethz.identifier.importid
imp5936530155a1f85723
ethz.ecitpid
pub:154961
ethz.eth
no
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-15T02:27:35Z
ethz.rosetta.lastUpdated
2018-12-02T06:26:59Z
ethz.rosetta.versionExported
true
ethz.COinS
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