Influence of film structure and composition on diffusion barrier performance of SiOx thin films deposited by PECVD
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Author / Producer
Date
2006
Publication Type
Journal Article
ETH Bibliography
yes
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Rights / License
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Publication status
published
Editor
Book title
Journal / series
Volume
200 (14-15)
Pages / Article No.
4564 - 4571
Publisher
Elsevier
Event
Edition / version
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Software
Geographic location
Date collected
Date created
Subject
Silicon oxide barrier coatings; Plasma-enhanced chemical vapour deposition (PECVD); Microwave; RF; X-ray photoelectron spectroscopy (XPS); Atomic force microscopy (AFM)
Organisational unit
03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
Notes
Received 10 February 2005, Accepted 30 March 2005, Available online 23 May 2005.