Changes in the etch rate of photosensitive polymers in function of the pulse number
OPEN ACCESS
Author / Producer
Date
2004-09-01
Publication Type
Journal Article
ETH Bibliography
yes
Citations
Altmetric
OPEN ACCESS
Data
Rights / License
Permanent link
Publication status
published
External links
Editor
Book title
Journal / series
Volume
79 (4-6)
Pages / Article No.
1271 - 1274
Publisher
Springer
Event
Edition / version
Methods
Software
Geographic location
Date collected
Date created
Subject
Organisational unit
03421 - Wokaun, Alexander (emeritus)
02513 - Laboratorium für Anorganische Chemie / Laboratory of Inorganic Chemistry
Notes
It was possible to publish this article open access thanks to a Swiss National Licence with the publisher