Highly strained Si and Ge microand nanobridges for micro- and optoelectronic applications
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Author / Producer
Date
2014
Publication Type
Doctoral Thesis
ETH Bibliography
yes
Citations
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Rights / License
Permanent link
Publication status
published
External links
Editor
Contributors
Examiner : Spolenak, Ralph
Examiner : Sigg, Hans
Book title
Journal / series
Volume
Pages / Article No.
Publisher
ETH Zurich
Event
Edition / version
Methods
Software
Geographic location
Date collected
Date created
Subject
KOMPLEMENTÄRE METALLOXID-HALBLEITERSCHALTUNGEN, CMOS (MIKROELEKTRONIK); GERMANIUM (CHEMICAL ELEMENTS); OPTOELECTRONIC DEVICES + PHOTOELECTRONIC DEVICES (OPTOELECTRONICS); SILICON (CHEMICAL ELEMENTS); GERMANIUM (CHEMISCHE ELEMENTE); SILICIUM (CHEMISCHE ELEMENTE); OPTOELEKTRONISCHE BAUELEMENTE + PHOTOELEKTRONISCHE BAUELEMENTE (OPTOELEKTRONIK); COMPLEMENTARY-METAL-OXIDE-SEMICONDUCTOR CIRCUITS, CMOS (MICROELECTRONICS)
Organisational unit
03692 - Spolenak, Ralph / Spolenak, Ralph
01314 - DR Materialwissenschaft / DR Materials Science
02160 - Dep. Materialwissenschaft / Dep. of Materials