Thin film transistors with a ZnO channel and gate dielectric layers of HfO2 by atomic layer deposition
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Author / Producer
Date
2010
Publication Type
Journal Article
ETH Bibliography
yes
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Rights / License
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Publication status
published
External links
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Book title
Journal / series
Volume
28 (6)
Pages / Article No.
1173
Publisher
American Institute of Physics
Event
Edition / version
Methods
Software
Geographic location
Date collected
Date created
Subject
Organisational unit
03609 - Hierold, Christofer / Hierold, Christofer
Notes
Published online 21 October 2010.