Exploring the limits of scanning electron microscopy for the metrology of critical dimensions of photoresist structures in the nanometer range
Metadata only
Datum
2014-08-11Typ
- Journal Article
Publikationsstatus
publishedExterne Links
Zeitschrift / Serie
Microelectronics ReliabilityBand
Seiten / Artikelnummer
Verlag
ElsevierThema
Scanning electron microscopy; Monte Carlo simulation; Metrology of nano structuresOrganisationseinheit
03380 - Huang, Qiuting (emeritus) / Huang, Qiuting (emeritus)
Anmerkungen
Received 26 June 2014, Accepted 8 July 2014, Available online 10 August 2014.