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dc.contributor.author
Yook, Se-Jin
dc.contributor.author
Fissan, Heinz
dc.contributor.author
Asbach, Christof
dc.contributor.author
Kim, Jung Hyeun
dc.contributor.author
Wang, Jing
dc.contributor.author
Yan, Pei-Yang
dc.contributor.author
Pui, David Y.H.
dc.date.accessioned
2017-06-12T01:01:10Z
dc.date.available
2017-06-12T01:01:10Z
dc.date.issued
2007
dc.identifier.issn
0021-8502
dc.identifier.issn
1879-1964
dc.identifier.other
10.1016/j.jaerosci.2006.11.010
dc.identifier.uri
http://hdl.handle.net/20.500.11850/113088
dc.language.iso
en
dc.publisher
Elsevier
dc.subject
EUVL
dc.subject
Mask protection
dc.subject
Mask carrier
dc.subject
Deposition velocity
dc.subject
Lagrangian particle tracking
dc.title
Evaluation of protection schemes for extreme ultraviolet lithography (EUVL) masks against top–down aerosol flow
dc.type
Journal Article
ethz.journal.title
Journal of Aerosol Science
ethz.journal.volume
38
ethz.journal.issue
2
ethz.journal.abbreviated
J. Aerosol Sci.
ethz.pages.start
211
ethz.pages.end
277
ethz.identifier.nebis
000034158
ethz.publication.place
Amsterdam
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02115 - Dep. Bau, Umwelt und Geomatik / Dep. of Civil, Env. and Geomatic Eng.::02608 - Institut für Umweltingenieurwiss. / Institute of Environmental Engineering::03887 - Wang, Jing / Wang, Jing
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02115 - Dep. Bau, Umwelt und Geomatik / Dep. of Civil, Env. and Geomatic Eng.::02608 - Institut für Umweltingenieurwiss. / Institute of Environmental Engineering::03887 - Wang, Jing / Wang, Jing
ethz.date.deposited
2017-06-12T01:05:36Z
ethz.source
ECIT
ethz.identifier.importid
imp59365420892a667235
ethz.ecitpid
pub:174752
ethz.eth
no
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-12T18:12:37Z
ethz.rosetta.lastUpdated
2021-02-14T13:59:28Z
ethz.rosetta.versionExported
true
ethz.COinS
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