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dc.contributor.author
Reiser, Alain
dc.contributor.author
Schuster, Rolf
dc.contributor.author
Spolenak, Ralph
dc.date.accessioned
2022-06-22T07:39:15Z
dc.date.available
2022-04-07T17:39:06Z
dc.date.available
2022-06-22T07:39:15Z
dc.date.issued
2022-04-14
dc.identifier.issn
2040-3364
dc.identifier.issn
2040-3372
dc.identifier.other
10.1039/d1nr08409g
en_US
dc.identifier.uri
http://hdl.handle.net/20.500.11850/541588
dc.identifier.doi
10.3929/ethz-b-000541588
dc.description.abstract
To explore a minimal feature size of <100 nm with electrochemical additive manufacturing, we use a strategy originally applied to microscale electrochemical machining for the nanoscale deposition of Co on Au. The concept's essence is the localization of electrochemical reactions below a probe during polarization with ns-long voltage pulses. As shown, a confinement that exceeds that predicted by a simple model based on the time constant for one-dimensional double layer charging enables a feature size of <100 nm for 2D patterning. We further indirectly verify the potential for out-of-plane deposition by tracking growth curves of high-aspect-ratio deposits. Importantly, we report a lack of anodic stability of Au tips used for patterning. As an inert probe is the prerequisite for controlled structuring, we experimentally verify an increased resistance of Pt probes against degradation. Consequently, the developed setup and processes show a path towards reproducible direct 2D and 3D patterning of metals at the nanoscale.
en_US
dc.format
application/pdf
en_US
dc.language.iso
en
en_US
dc.publisher
Royal Society of Chemistry
en_US
dc.rights.uri
http://creativecommons.org/licenses/by/3.0/
dc.title
Nanoscale electrochemical 3D deposition of cobalt with nanosecond voltage pulses in an STM
en_US
dc.type
Journal Article
dc.rights.license
Creative Commons Attribution 3.0 Unported
dc.date.published
2022-03-28
ethz.journal.title
Nanoscale
ethz.journal.volume
14
en_US
ethz.journal.issue
14
en_US
ethz.pages.start
5579
en_US
ethz.pages.end
5588
en_US
ethz.version.deposit
publishedVersion
en_US
ethz.identifier.wos
ethz.identifier.scopus
ethz.publication.place
Cambridge
en_US
ethz.publication.status
published
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::02645 - Institut für Metallforschung / Institute of Metals Research::03692 - Spolenak, Ralph / Spolenak, Ralph
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::02645 - Institut für Metallforschung / Institute of Metals Research::03692 - Spolenak, Ralph / Spolenak, Ralph
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::02645 - Institut für Metallforschung / Institute of Metals Research::03692 - Spolenak, Ralph / Spolenak, Ralph
ethz.date.deposited
2022-04-07T17:40:04Z
ethz.source
WOS
ethz.eth
yes
en_US
ethz.availability
Open access
en_US
ethz.rosetta.installDate
2022-06-22T07:39:32Z
ethz.rosetta.lastUpdated
2022-06-22T07:39:32Z
ethz.rosetta.exportRequired
true
ethz.rosetta.versionExported
true
ethz.COinS
ctx_ver=Z39.88-2004&amp;rft_val_fmt=info:ofi/fmt:kev:mtx:journal&amp;rft.atitle=Nanoscale%20electrochemical%203D%20deposition%20of%20cobalt%20with%20nanosecond%20voltage%20pulses%20in%20an%20STM&amp;rft.jtitle=Nanoscale&amp;rft.date=2022-04-14&amp;rft.volume=14&amp;rft.issue=14&amp;rft.spage=5579&amp;rft.epage=5588&amp;rft.issn=2040-3364&amp;2040-3372&amp;rft.au=Reiser,%20Alain&amp;Schuster,%20Rolf&amp;Spolenak,%20Ralph&amp;rft.genre=article&amp;rft_id=info:doi/10.1039/d1nr08409g&amp;
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