Inducing in-plane uniaxial magnetic anisotropies in amorphous CoFeB thin films
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Date
2023-11-01Type
- Journal Article
Abstract
Controlling the magnetic anisotropy of thin magnetic films with in-plane magnetization is of highest relevance particularly for magnetic field sensors. Here, the origin and magnitude of the in-plane magnetic anisotropies of ferromagnetic
Co20Fe60B20 films with obliquely sputter-deposited Ta-seed layers are investigated. Uniaxial in-plane anisotropy constants in the range of a few kJ/m³
up to about 25 kJ/m³ become accessible. We find that the anisotropy is predominantly determined by an surface rather than the bulk term. However, the magnetostatic effects arising from the measured directional roughness of the Ta seed cannot fully account for the observed anisotropy, indicating the existence of an additional origin of the anisotropy arising from the oblique sputtering. Further, we find that the anisotropies of films deposited with normal incidence in an applied magnetic field are about an order of magnitude weaker. Overall, this work shows that oblique sputtering offers a strategy to induce in plane anisotropies of up to 25 kJ/m³
in CoFeB, however, at the expense of larger Ta seed thickness. Show more
Publication status
publishedExternal links
Journal / series
Journal of Magnetism and Magnetic MaterialsVolume
Pages / Article No.
Publisher
ElsevierSubject
In-plane anisotropy; Magnetic thin films; Obliquely deposited seed layerOrganisational unit
09675 - Herrmann, Inge Katrin (ehemalig) / Herrmann, Inge Katrin (former)
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