High Power Sunlight-Simulated UV-Induced Radical Polymerization: Self-Initiation and Self-Crosslinking
Open access
Date
2024Type
- Journal Article
ETH Bibliography
yes
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Abstract
Under high power UV irradiation, radicals can be generated from double bonds through photodissociation, H-abstraction, or oxygen initiation mechanisms. This eliminates the need for externally added initiators in photopolymerization. This study investigates high-power sunlight-simulated UV-induced free radical polymerization under various experimental conditions, including the presence of inhibitors, open or closed systems, and partial degassing. Additionally, high-power sunlight-simulated UV-induced atom transfer radical polymerization is explored by externally adding CuBr2/ligand (1:2) catalyst at 100 or 1000 ppm molar concentration of copper. Delicate fabrication of real-world thin films, coatings, and delicate 3D composites further demonstrates the high reliability and versatility of this technology. Show more
Permanent link
https://doi.org/10.3929/ethz-b-000657516Publication status
publishedExternal links
Journal / series
Macromolecular Materials and EngineeringPages / Article No.
Publisher
Wiley-VCHSubject
atom transfer radical polymerization; free radical polymerization; high power UV; polymeric materials; thin filmsFunding
801781 - Modified Gravity on Trial (EC)
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ETH Bibliography
yes
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