Electron Beam Lithography for Nanoelectronics and Nanoparticle Assembly Applications
dc.contributor.author
Rey, Antje
dc.contributor.author
Lörtscher, Emanuel
dc.contributor.author
Kuemin, Cyrill
dc.contributor.author
Jain, Titoo
dc.contributor.author
Wolf, Heiko
dc.contributor.author
Bjørnholm, Thomas
dc.contributor.author
Stemmer, Andreas
dc.contributor.author
Riel, Heike
dc.date.accessioned
2017-06-10T17:58:55Z
dc.date.available
2017-06-10T17:58:55Z
dc.date.issued
2011
dc.identifier.uri
http://hdl.handle.net/20.500.11850/67970
dc.language.iso
en
dc.publisher
FIRST-Lab; Raith GmbH
dc.title
Electron Beam Lithography for Nanoelectronics and Nanoparticle Assembly Applications
dc.type
Other Conference Item
ethz.event
Electron Beam Lithography Workshop
ethz.event.location
Zürich, Switzerland
ethz.event.date
November 15, 2011
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::03444 - Stemmer, Andreas / Stemmer, Andreas
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::03444 - Stemmer, Andreas / Stemmer, Andreas
ethz.date.deposited
2017-06-10T17:59:30Z
ethz.source
ECIT
ethz.identifier.importid
imp593650af87d8757971
ethz.ecitpid
pub:108053
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-20T17:17:19Z
ethz.rosetta.lastUpdated
2018-11-02T09:52:36Z
ethz.rosetta.versionExported
true
ethz.COinS
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Other Conference Item [18996]