Thin SiGe virtual substrates for Ge heterostructures integration on silicon
dc.contributor.author
Cecchi, S.
dc.contributor.author
Gatti, E.
dc.contributor.author
Chrastina, D.
dc.contributor.author
Frigerio, J.
dc.contributor.author
Müller Gubler, E.
dc.contributor.author
Paul, D.J.
dc.contributor.author
Guzzi, M.
dc.contributor.author
Isella, G.
dc.date.accessioned
2017-06-11T06:16:20Z
dc.date.available
2017-06-11T06:16:20Z
dc.date.issued
2014
dc.identifier.issn
0021-8979
dc.identifier.issn
1089-7550
dc.identifier.other
10.1063/1.4867368
dc.identifier.uri
http://hdl.handle.net/20.500.11850/81800
dc.language.iso
en
dc.publisher
American Institute of Physics
dc.title
Thin SiGe virtual substrates for Ge heterostructures integration on silicon
dc.type
Journal Article
ethz.journal.title
Journal of Applied Physics
ethz.journal.volume
115
ethz.journal.issue
9
ethz.journal.abbreviated
J. Appl. Physi.
ethz.pages.start
093502
ethz.size
6 p.
ethz.notes
Received 28 November 2013, Accepted 20 February 2014, Published online 4 March 2014.
ethz.identifier.wos
ethz.identifier.scopus
ethz.identifier.nebis
000037502
ethz.publication.place
Melville, NY
ethz.publication.status
published
ethz.date.deposited
2017-06-11T06:20:30Z
ethz.source
ECIT
ethz.identifier.importid
imp593651bae17cc57073
ethz.ecitpid
pub:129004
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-13T18:13:58Z
ethz.rosetta.lastUpdated
2021-02-14T11:30:10Z
ethz.rosetta.versionExported
true
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