Sputtering rates of lead chalcogenide-based ternary solid solutions during inductively coupled argon plasma treatment
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Date
2011Type
- Journal Article
ETH Bibliography
yes
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Publication status
publishedExternal links
Journal / series
Semiconductor Science and TechnologyVolume
Pages / Article No.
Publisher
IOP PublishingNotes
Received 26 June 2011, In final form 01 August 2011, Published 30 August 2011.More
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ETH Bibliography
yes
Altmetrics